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micro sf6 shape in DENMARK

micro sf6 shape in DENMARK

Study of the roughness in a photoresist masked, isotropic.· PDF fileStudy of the Roughness in a Photoresist Masked, Isotropic, SF 6-Based ICP Silicon Etch Kristian P. Larsen,a Dirch Hjorth Petersen,a and Ole Hansena,b,z aMIC - Department of Micro and Nanotechnology, NanoDTU, and bDanish National Research Foundation’s Center for Individual Nanoparticle Functionality (CINF), Technical University of Denmark,

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