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Compact critical point of sf6 in ESTONIA

Compact critical point of sf6 in ESTONIA

Nanofabrication Facility | UCSB Shared Instrumentation NetworkThe Reactive Ion Etcher #1 is a turbo-pumped plasma deposition system from Sputtered Films that has been modified by the UCSB Nanofabrication Research Facility for chlorine-based reactive ion etching @ 13.56 Mhz. Special features include: a very small volume sample loadlock (for low O2 partial pressure) with integral four inch sample holder and a HeNe laser etch monitor.

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